Technical Program of 1st Workshop
(Nov. 30-Dec. 2, 1992)
Welcome and Invited Paper Session (Monday, Nov. 30, 1992, 10:00-12:30)
Chair: Kanji Otsuka, Hitachi
1. Opening Remarks
K. Otsuka, Hitachi
2. Packaging Technology for the PC 9800 (Invited)
K. Moritani, K. Fujinami and Y. Ikeda, NEC
3. Packaging for Video Camera-Recorders (Invited)
M. Fujisaku, Matsushita
4. Technology Changes That Affect Packaging (Invited)
J. W. Balde, IDC
Session 1: High Density Packaging (Monday, Nov. 30, 1992, 13:30-15:35)
Co-Chairs: Dennis R. Olsen, Motorola and Kenzo Hatada, Matsushita
1.1 Lead On Chip Package Development
J. Arita, I. Anjoh, A. Nishimura and M. Ichitani, Hitachi
Ltd., Japan
1.2 OMPAC, "A New Kid on the Block"
J. Sloan, V. Nomi, H. Wilson, Motorola, USA
1.3 Low Profile, 3-D Memory for Portable and Hand Held Applications
M. F. Suer, R. Some, T. Johnson and S. Shanken, Irvine
Sensors Corp., USA
1.4 High Density Memory Packaging with Vertical Surface Mount Package
(VPAK)
T. Chiu, N. McLellan and W. Schroen, TI, USA
1.5 Simulation of Radioactive Impurities and Electrical Properties
of LOC Packages
T. Yoshida and K. Hatada, Matsushita Electric, Japan
Session 2: Electrical Modeling and Simulation (Monday, Nov. 30, 1992, 16:05-18:10)
Co-Chairs: Hans Hentzell, Linkoping Univ. and Toshio Sudo,
Toshiba
2.1 Minimization of Effective Inductance of Ground Plane and Experimental
Simultaneous Switching Noise in a Multilayer VLSI Package
N. Hirano, Y. Hirata and T. Sudo, Toshiba Corp., Japan
2.2 Current Distribution Analysis for Power/Ground Planes of VLSI
Packages
K. Nakamata, M. Nishimura and S. Ninomiya, Kyocera
Corp., Japan
2.3 Cost Effective Inductance Calculation Using Personal Computers
A. Nakamura, T. Miwa and K. Otsuka, Hitachi Ltd., Japan
2.4 Impact of Reference Plane Parasitics on the System Noise in High
Speed Applications
J. L. Prince, R. Senthinathan, A. C. Cangellaris and
K. Russell, Univ. of Arizona, USA
2.5 3-D EM Field Analysis Using the Spacial Network Method and Its
Application to a High-Frequency Package
R. Konno and N. Kukutsu, NTT, Japan
Session 3: High Performance Package Design (Tuesday, Dec. 1, 8:00-9:40)
Co-Chairs: Elaine Pope, Intel and Hisashi Tomimuro, NTT
3.1 Shielded Differential Coplanar Transmission Lines: A New Structure
for Very High Speed Packages Design
M. Bedouani, Bull, France
3.2 High Lead Count and High Performance Ceramic QFP
Y. Nakatsuka, Y. Morita, M. Fujii and Y. Miura, Sumitomo
Metal Industries, Japan
H. Ohtani, E. Takahashi, Sumitomo Metal Ceramics Inc.,
Japan
3.3 Development of High Density Down-Sizing PGA by Super Fine Pitch
Pattern for High Speed Application
M. Miura, T. Kudo, H. Ohtani and F. Matsunaga, Sumitomo
Metal Ceramics, Japan
3.4 Time and Frequency Domain Characterization of Pin Grid Array
for High Speed Digital Gate Arrays
T. W. Goodman, H. Fujita and Y. Murakami, Sony Corp.,
Papan
A. T. Murphy, DuPont, USA
Session 4: Reliability of VLSI Packaging (Tuesday, Dec. 1, 10:10-11:50)
Co-Chairs: Wulf H. Knausenbeger, AT&T and Hiroshi Shibata,
Mitsubishi
4.1 Reliability Studies on Thin Package
K. Shimomura, T. Ueda, I. Sasaki, T. Tachikawa and
K. Nakagawa, Mitsubishi Electric, Japan
4.2 Estimation of Vapour Pressure in the Plastic Package during Reflow
Soldering
K. Sawada, H. Mukaida, S. Itoh, T. Nakazawa, N. Kawamura
and N. Izawa, Toshiba Corp., Japan
4.3 Obtaining High Quality VLSI Package with QPP
K. Feameil and R. Raines, IBM, USA
4.4 Thermal Strain of the Bonding Stage at the Gang Bonding Process
T. Hashimoto, M. Yasunaga and T. Kondoh, Mitsubishi
Electric, Japan
Session 5: Thermal and High Speed Signal Management (Tuesday, Dec. 1, 19:00-20:40)
Co-Chairs: Les Fox, DEC and George G. Harman, NIST
5.1 Air Cooling of MCMs Mounted on Card-on-board Packaging System
A. Harada, Y. Kaneko and T. Kishimoto, NTT, Japan
5.2 Immersion Cooling of Multi Chip Modnles with Fluorinert Liquids
in an Enclosed System
H. Kristiansen, T. Gleditsch and A. Bjoreklett, Center
for Industrial Research
Dolphin SCI Technology A/S, Norway
5.3 Packaging Techniques for the 620Mb/s High Speed Switching Module
M. Yamada, T. Handa, S. Iida and J. Utsunomiya, Oki
Electric, Japan
5.4 Electrical Modeling of 3D Structures in MCM Interconnect
R. Beck, R. Brodowski and R. Dumcke, Technical University
of Berlin, Germany
Session 6: Package Manufacturing Technology (Tuesday, Dec. 1, 21:00-22:40)
Co-Chairs: Justin C. Bolger, Emerson & Cuming and Teruo
Kosaka, NEC
6.1 The Performance of a CVD Diamond Bonding Tool
K. Tanaka, Sumitomo Electric Industries, Japan
6.2 High Reliability Wire Bonding Technology by the 120kHz Frequency
of Ultrasonic
T. Miwa and K. Otsuka, Hitachi Ltd., Japan
T. Araki, I. Seki. K. Kikuchi and N. Fujita, Hitachi
Hokkai Semiconductor, Japan
6.3 Development of Precoat Soldering Technology for Volume Production
Using Super-Solder
Y. Obara, H. Irie and K. Fuse, Super Solder Technologies
H. Shiroishi, Furukawa Electric; Y. Nishi, Harima Chemicals,
Japan
6.4 Frame Wirebonding
J. W. Balde, IEEE CHMT Standard Chair, USA
J. Walker, Northern Telecom, Canada
Session 7: Material and Applications (Wednesday, Dec. 2, 1992, 8:00-10:05)
Co-Chairs: Karel Kurzweil, Bull and Nobuo Kamehara, Fujitsu
7.1 Development and Commercializing of Ionic Type Photosensitive
Polyimides
M. Asano, M. Eguchi, K. Kusano and K. Niwa, Toray Industries,
Japan
7.2 Via Generation in Benzlycyclobutane Dielectrics
D. C. Fryel, R. F. Harris, R. H. Heistand II, E. S.
Moyer, E. S. Rutter and P. Garrou, Dow Chemical, USA
M. J. Berry, B. Rogers and I. Turlik, MCNC, USA
S. Bidstrup, T. Hodges, P. Kohl and J. Taylor, Georgia
Inst, of Tech., USA
K. Berry, F. David and M. Lanka, Polyoon, USA
7.3 A Thermal Stable Water Soluble Solder Paste
B. Carpenter, K. Pcarsall, R. Raines and R. Reich,
IBM, USA
7.4 Development and Applications of High Reliable Cofired Aluminum
Nitride Packages
N. Ito and R. Imura, Kyocera, Japan
7.5 Multilayer AlN Circuit Board for VLSI Packaging
M. Hida, M. Tsukada, K. Hashimoto and N. Kamehara,
Fujitsu Lab., Japan
Session 8: MCMs (Wednesday, Dec. 2, 1992, 10:35-13:00)
Co-Chairs: John W. Balde, IDC and Hisashi Tomimuro, NTT
8.1 Coaxial SMT Module Connector for High-speed MCM
S. Sasaki, T. Kishimoto and N. Sugiura, NTT, Japan
8.2 Flip Chip, Multichip Modules, Microsystem Applications
G. Nicolas, LETI-DTA, France
8.3 High Frequency Properties of Multi Chip Modules
Hans Hentzell, IMM, Sweden
8.4 High Density Si on Module
M. Kimura, T. Shimoto, K. Matsui, T. Kusaka, N. Senba
and T. Koike, NEC, Japan
8.5 A Flip Chip Interconnection with Solid Copper Core Technology
for Multichip Modules
K. Suzuki, H. Uchida, A. Haga and K. Suzuki, NEC, Japan
8.6 A Comparison of MCM Implementations for Mainframe and Workstation
Computers
K. K. Liu and S. Westbrook, MicroModule Systems, Inc.,
USA
Closing Remarks (Wednesday, Dec. 2, 1992, 13:00)